Case Study: Semiconductor Wafer Wastewater Reuse with Megaflux-CUF
- gabriela2554
- 3 days ago
- 2 min read
In the semiconductor industry, the largest wastewater stream is typically the process/wafer stream, though the largest consumption is often cooling-tower evaporation, where ultrapure (UPW) water is required. UPW demand is massive in these industries, and regions hosting these industries face water stress and tighter discharge rules; reuse cuts freshwater intake and risk. Therefore, recycling wastewater into the cooling-tower evaporation alleviates the water consumption and demand from fresh sources, at the same time that reaching sustainability targets.
However, the wafer stream wastewater originates from the combination of cutting/grinding, CMP (chemical–mechanical planarization), etch/clean, and scrubbers. Typically includes very fine particles (silica, alumina, ceria; often <100 nm), metals and metal oxides (e.g., Cu, W) from CMP slurries, and fluoride and silica from HF-based cleans and local scrubber streams. This variable chemistry destabilizes conventional treatment to produce UPW, and a more efficient and tailored treatment process is required.
Ultrafiltration (UF) is needed before RO/EDI
Ultrafiltration (UF) is an essential pretreatment step before RO and EDI. By removing fine particles and colloids, UF stabilizes downstream performance, making semiconductor wastewater reuse both technically reliable and economically viable.
Particle barrier for RO: CMP-derived nano/colloidal silica and metal oxides are primary RO foulants; UF removes them efficiently, stabilizing flux and cleaning frequency.
Handles variable streams: UF tolerates swings in turbidity/PSD that occur in CMP and HF-scrubber waters, providing a consistent RO feed.
Hollow-fiber PVDF fits fabrication duty: chemically cleanable, good oxidant tolerance, and low-pressure operation, common features for stable tertiary polishing.
Well established in reuse trains: MF/UF as RO pretreatment is standard practice in industrial reuse.
Project Overview
In this project, we treated 2,000 m³/day of wastewater from wafer production, enabling wafer recovery and ultrapure water reuse.
Problem: UF system installation in a reduced area for wafer recovery and Fine particle wastewater reuse
Solution: An optimized UF system design reduced installation area, enabling efficient use of space for essential ultrapure water production facilities.
Treatment Capacity: 2,000 m³/day
Membrane: PHILOS PVDF hollow fiber membrane
Filtration process: Wafer production process-UF 0.03㎛ -RO–EDI-Polisher
Location: South Korea
Outcome: Economic benefits realized through wafer recovery and wastewater recycling for ultrapure water production.
Key insights from this case study
Fine Particle Wastewater Reuse: The system efficiently treated wastewater to recover valuable wafers and provide ultrapure water for reuse in semiconductor manufacturing.
Optimized Space Utilization: By reducing the footprint of the UF system, we freed up space for the installation of essential facilities required for ultrapure water production, improving facility efficiency.
Economic Benefits Through Water Reuse: The system contributed significant cost savings by enabling wafer recovery and reducing the need for fresh ultrapure water, making the operation more sustainable and cost-effective.
This project is a perfect example of how PHILOS Megaflux-CUF Ultrafiltration is transforming industrial water treatment, not only by enhancing performance but also by driving sustainability and operational savings.
Stay tuned for more updates and case studies on how Megaflux-CUF is helping industries optimize water treatment processes! Visit www.pmbr.co.kr or contact us at gabriela@pmbr.co.kr.
Find us on other social media platforms:
Comments